PECVD

等離子體增強化學氣相沉積（PECVD）是一種利用等離子內的能量在晶片表面引發反應的工藝，否則該反應將需要與常規CVD相關的更高溫度。沉積過程中的高能離子轟擊還可以改善薄膜的電子和機械性能。
Delta沉積系統

SPTS的Delta PECVD

系統可用於微機電，化合物半導體和高級封裝行業中的廣泛應用，尤其是在需要低處理溫度的應用中。

Osprey® PECVD

Osprey® PECVD

PECVD for Advanced Packaging For advanced packaging applications, SPTS' Osprey PECVD system...

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Delta® PECVD

Delta® PECVD

The DeltaTM PECVD systems are used for a wide range of applications within MEMS and compound semiconductors Key...

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