Delta® PECVD

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Delta^TM Deposition Systems

The Delta^TM PECVD systems are used for a wide range of applications within MEMS and compound semiconductors

Key Benefits

• Wafer sizes from 75mm to 300mm
• Radially symmetrical gas flow for superior wafer-in-wafer (WIW) uniformity
• Up to 10 gas lines and optional on-board liquid delivery system
• Mixed frequency plasma capability for stress tuning
• Active platen cooling for critical, low temperature [<175°C] packaging applications
• Single and multi-wafer preheat chamber options for de-gassing sensitive substrates

Markets Served by Delta^TM PECVD:

• MEMS
• Photonics
• RF IC