单片式晶圆处理平台

为满足批量生产、试生产和研发应用的需求,SPTS 在一系列可供选择的晶圆处理平台上提供多种蚀刻与沉积工艺技术:

fxP® – 8 个端口的集群式系统支持最多 6 个工艺腔体,可实现产能、利用率和生产力的最大化。

 c2L – 适用于小型量产的平台,兼容 3" 至 8" 晶圆,支持最多 3个工艺模块,可实现灵活性和有效控制。

 LPX – 该平台集手动装载及单片晶圆真空装载于一体,锁定与适用SPTS 蚀刻或等离子体沉积工艺,属于小批量或研发应用的低成本平台。

fxP® Platform

fxP® Platform

The fxP® is an 8-sided cluster system supporting up to 6 process modules for the ultimate in throughput, availability...

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c2L Platform

c2L Platform

The c2L is an cost-effective cluster platform for low volume  or pilot production. It supports up to 3 process modules...

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LPX Platform

LPX Platform

The LPX platform combines a manually-loaded, single wafer vacuum load-lock with SPTS etch or deposition plasma...

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