ICP Etch
SPTS ICP process module is highly flexible and etches a wide range of materials including oxides, nitrides, polymers, low aspect ratio Si and metals. The Omega® ICP process module uses a patented high density plasma source incorporating a radial coil design. The The ICP module is the industry leader for compound semiconductor applications.
Typical materials:
- GaAs
- GaN
- SixNy
- BCB and Polyimide